Exploring FeFET Degradation Mechanisms: Mid-Interlayer as a Viable Solution for Stable Retention, Disturb Immunity, and Low Vth Variation

Author

Giuk Kim, Sangho Lee, Hyojun Choi, Hoon Kim, Seokjoong Shin, Sanghyun Park , Kwangyou Seo, Kwangsoo Kim, Wanki Kim, Daewon Ha, Jinho Ahn, Sanghun Jeon

Journal

2025 Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)

Status

Accepted

Vol

2025

Year

2025

Link

https://doi.org/10.23919/VLSITechnologyandCir65189.2025.11075182 269회 연결