Excellent Reliability and High-Speed Antiferroelectric HfZrO2 Tunnel Junction by a High-Pressure Annealing Process and Built-In Bias Engineering

Author

Youngin Goh, Junghyeon Hwang, Sanghun Jeon

Journal

ACS Applied Materials & Interfaces

Vol

12

Page

57539-57546

Year

2020

Link

https://pubs.acs.org/doi/full/10.1021/acsami.0c15091 717회 연결